Standard Sputtering Ion Sources
- Ion beam energy up to 5 keV
- Argon ion cleaning with adjustable energy and broad beam spot
- Computer source control
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| Max. Energy |
Max. Beam Current |
Model Description |
| 5 keV |
10 μA |
» IG-5-C |
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Scannable Fine Focus Ion Source for sputtering, depth profiling and ISS
- Ion beam energy up to 5 keV
- Multiple ion species
- Focused ion beam with scanning for depth profiling
- Computer scanning package
- Optional differential pumping for UHV operation
- Computer source control
- High brightness ion beam
- Mass separator optional
- Non-line of sight operation available
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Scannable Fine Focus Ion Source for sputtering, depth profiling and SIMS
- Standard Energy up to 30 keV High intensity, high brightness fine focused ion beam
- Multiple ion species
- Differential pumping for UHV operation
- Optional beam tilt for neutral rejection
- Optional fine beam focus for scanning and microprobe operation
- High brightness ion beam
- Mass separator optional
- Non-line of sight operation available
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Proton Source for space research
- Pure proton beam in an energy range up to 100 keV
- Optional magnetic sector mass filtering
- Adjustable beam size and homogeneity
- Differential pumping for UHV operation
- Compact, modular design to be mounted as add-on source to vacuum chambers
- Large spot size
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